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Volumn 433, Issue , 1999, Pages 449-454

Comparative STM and RHEED studies of Ge/Si(001) and Si/Ge/Si(001) surfaces

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; LATTICE CONSTANTS; MORPHOLOGY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON; SURFACE ROUGHNESS; SURFACE TOPOGRAPHY; SURFACE TREATMENT; THREE DIMENSIONAL; TWO DIMENSIONAL;

EID: 0033330401     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(99)00113-2     Document Type: Article
Times cited : (22)

References (19)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.