On the design of piezoresistive silicon cantilevers with stress concentration regions for scanning probe microscopy applications

Journal of Micromechanics and Microengineering

Volumn 10, Issue 4, 2000, Pages 483-491

  Bashir, R ^a   Gupta, A ^a   Neudeck, G W ^a   McElfresh, M ^a   Gomez, R ^a  

^a PURDUE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; FABRICATION; FORCE MEASUREMENT; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING SILICON; SENSITIVITY ANALYSIS; STRESS CONCENTRATION; TORQUE; TORSIONAL STRESS;

PIEZORESISTIVE SILICON CANTILEVERS; SCANNING PROBE MICROSCOPY; SOFTWARE PACKAGE ANSYS;

MICROELECTROMECHANICAL DEVICES;

EID: 0034511116     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/10/4/301     Document Type: Article

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