An improved electron scattering simulation at the mask in a projection lithography system

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 12 B, 2000, Pages 6861-6868

  Kotera, Masatoshi ^a   Ishida, Yoshihisa ^a   Naruse, Kentarou ^a   Shimizu, Isao ^b   Tomo, Youichi ^b   Yoshida, Akira ^b   Kojima, Yoshinori ^b   Yamabe, Masaki ^b  

^a OSAKA INSTITUTE OF TECHNOLOGY   (Japan)

^b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

Electron displacement at wafer; Electron energy loss spectrum; Electron scattering simulation; Epl mask; Longitudinal Coulomb effect

Indexed keywords

COMPUTER SIMULATION; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON SCATTERING; MASKS; MATHEMATICAL MODELS;

ELECTRON PROJECTION LITHOGRAPHY (EPL); LONGITUDINAL COULOMB INTERACTION EFFECT;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034430070     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.6861     Document Type: Article

References (24)

1. E. Munro: Nucl. Instrum. & Method Phys. Res. A258 (1987) 443.
2. H. G. Jansen: Coulomb Interactions in Particle Beams (Academic Press, Boston, 1990).
3. Y. Sohda, Y. Someda, N. Saitou and H. Itoh: J. Vac. Sci. & Technol. B13 (1995) 2419.
4. L. R. Harriott, S. D. Berger, J. A. Liddle, G. P. Watson and M. M. Mkrtchyan: J. Vac. Sci. & Technol. B13 (1995) 2404.
5. W. Stickel: J. Vac. Sci. & Technol. B16 (1997) 3211.
6. H. Yamashita, K. Tokunaga, Y. Kojima, H. Nozue and E. Nomura: J. Vac. Sci. & Technol. B13 (1995) 2478.
7. M. Kotera, K. Yamaguchi, T. Okagawa, K. Matsuoka, Y. Kojima and M. Yamabe: Jpn. J. Appl. Phys. 38 (1999) 7031.
8. H. Yamashita, T. Ema, K. Itoh, H. Nozue and E. Nomura: J. Vac. Sci. & Technol. B14 (1996) 3845.
9. M. M. Mkrtchyan, J. A. Liddle, A. E. Novembre, W. K. Waskiewicz, G. P. Wastson, L. R. Harriott and D. A. Muller: J. Vac. Sci. & Technol. B16 (1998) 3385.
10. M. Kotera, K. Yamaguchi, T. Okagawa, K. Matsuoka, Y. Kojima and M. Yamabe: J. Vac. Sci. & Technol. B17 (1999) 2921.
11. H. Yamashita, V. S. H. Wen, A. R. Neureuther and E. Nomura: J. Vac. Sci. & Technol. B16 (1998) 3227.
12. K. Murata, T. Matsukawa and R. Shimizu: Jpn. J. Appl. Phys. 10 (1971) 678.
13. C. R. K. Marrian, F. K. Perkins, D. Park, E. A. Dobisz, M. C. Peckerar, K.-W. Rhee and R. Buss: J. Vac. Sci. & Technol. B14 (1996) 3864.
14. Z. Cue: Microelectron. Eng. 41/42 (1998) 175.
15. S.-H. Kim, Y.-M. Ham, C. Lee and K. Chun: Microelectron. Eng. 41/42 (1998) 179.
16. M. Inokuti: Rev. Mod. Phys. 43 (1971) 293.
17. S. Kawata, N. Katakura, S. Takahashi and K. Uchikawa: J. Vac. Sci. & Technol. B17 (1999) 2864.
18. W. K. Waskiewicz, S. D. Berger, L. R. Harriott, M. M. Mkrtchyan, S. W. Bowler and M. Gibson: Proc. SPIE 13 (1995) 2522.
19. H. Yamashita, E. Nomura and H. Nozue: J. Vac. Sci. & Technol. B15 (1997) 2263.
20. Z. J. Ding and R. Shimizu: Surf. Sci. 222 (1989) 313.
21. D. R. Penn: Phys. Rev. B35 (1987) 482.
22. C. C. Ahn, O. L. Krivanek, R. P. Burgner, M. M. Disko and P. R. Swann: EELS Atlas, ASU-Gatan (1986).
23. E. Sugata: Electron Ion Beam Handbook (Nikkan Kougyou Shinbun, Tokyo, 1986) p. 61 [in Japanese].
24. T. Yahiro, N. Hirayanagi, H. Yamamoto and K. Suzuki: Ext. Abst. 60th Autumn Meeting 1999 of the Jpn. Soc. Appl. Phys. (1999) p. 603 [in Japanese].