Influence of the mask-scattered electrons in the cell-projection lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 2921-2926

  Kotera, M ^a   Yamaguchi, K ^a   Okagawa, T ^b   Matsuoka, K ^b   Kojima, Y ^b   Yamabe, M ^b  

^a OSAKA INSTITUTE OF TECHNOLOGY   (Japan)

^b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033267612     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591097     Document Type: Article

References (13)

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