Mask electron modeling for Coulomb interaction by mask-scattered electrons in electron-beam projection lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3227-3231

  Yamashita, Hiroshi ^a   Wen, Victor S H ^b   Neureuther, Andrew R ^b   Nomura, Eiichi ^a  

^a NEC CORPORATION   (Japan)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0003952449     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590356     Document Type: Article

References (10)

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