Effect of rapid thermal annealing on the structure and the electrical properties of atomic-layer-deposited Ta2O5 films

Journal of the Korean Physical Society

Volumn 37, Issue 6, 2000, Pages 975-979

  Kim, Yong Shin ^a   Park, Sang Hee Ko ^a   Yun, Sun Jin ^a   Kang, Jung Sook ^b  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

^b Kyungpook National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0034347681     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.37.975     Document Type: Article

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