Large-area atomic layer deposition and characterization of Al2O3 film grown using AlCl3 and H2O

Journal of the Korean Physical Society

Volumn 33, Issue SUPPL. 2, 1998, Pages

  Yun, Sun Jin ^a   Kang, Jung Sook ^a   Paek, Mun Cheol ^a   Nam, Kee Soo ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032282481     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)

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2. T. Suntola, Handbook of Crystal Growth 3, Thin Films and Epitaxy, Part B: Growth Mechanics and Dynamics edited by D. T. J. Hurle (Elsevier Science, Amsterdam 1994), Chap. 14.
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4. S. J. Yun, S.-D. Nam, J.-S. Kang, K.-S. Nam and H.-M. Park, J. Soc. Inform. Displays, in press (1998).
5. J. F. Moulder, W. F. Stickle, P. E. Sobol and K. D. Bomben, in Handbook of X-ray Photoelectron Spectroscopy, edited by J. Chastain (Perkin-Elmer, Eden Prallie, MN, 1992), p .55.
6. S. Dey and S. J. Yun, Appl. Suf. Sci., to be published.
7. Y. A. Ono, in Electroluminescent Displays (World Scientific, Singapore, 1995), p. 63.