Multilayered tantalum-aluminum oxide films grown by atomic layer deposition

Journal of the Korean Physical Society

Volumn 35, Issue SUPPL. 2, 1999, Pages

  Kim, Yong Shin ^a   Kang, Jung Sook ^a   Yun, Sun Jin ^a   Cho, Kyoung Ik ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 4243218642     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (10)

1. A. F. Ttasch, Jr. and L. H. Parker, Proc. IEEE. 77, 374 (1989).
2. Y. A. Ono, Electroluminescent Displays ( World Scientific, Singapore, 1995).
3. K. Kukli, J. Ihanus, M. Ritala and M. Leskela, J. Electrochem. Soc. 144, 300 (1997).
4. K. Kukli, J. Ihanus, M. Ritala and M. Leskela, Appl. Phys. Lett. 68, 3737 (1996).
5. H. Kattelus, M. Ylilammi, J. Saarilahti, J. Antson and S. Lindfors, Thin Solid Films 225, 296 (1993).
6. T. Suntola and M. Simpson, Atomic Layer Epitaxy (Blackie and Son, Glasgow, 1990).
7. S. J. Yun, K-H. Lee, J. Skarp, H-R. Kim and K-S. Nam, J. Vac. Sci. Technol. A15, 2993 (1997).
8. S. J. Yun, unpublished results.
9. T. Anyama, S. Saida, Y. Okayama, M. Fujisaki, K. Imai and T. Arikado, J. Electrochem. Soc. 143, 977 (1996).
10. S. K. Tiku and G. C. Smith, IEEE Trans. Electron Devices ED-31, 105 (1984).