Dynamics of plasma-surface interactions and feature profile evolution during pulsed plasma etching

Thin Solid Films

Volumn 374, Issue 2, 2000, Pages 208-216

  Ono, Kouichi ^a   Tuda, Mutumi ^b  

^a KYOTO UNIVERSITY   (Japan)

^b MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ANISOTROPY; DESORPTION; INTERFACES (MATERIALS); MICROSCOPIC EXAMINATION; PLASMA ETCHING; REACTION KINETICS; REACTIVE ION ETCHING; SEMICONDUCTING SILICON; TRANSPORT PROPERTIES;

HIGH DENSITY PLASMAS; LANGMUIR ADSORPTION KINETICS; PULSED PLASMA ETCHING; TIME DEPENDENT SURFACE CHEMISTRY;

SEMICONDUCTING FILMS;

EID: 0034292238     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01152-4     Document Type: Article

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