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Volumn 10, Issue 9, 2000, Pages 2085-2089

Highly oriented 3D-hexagonal silica thin films produced with cetyltrimethylammonium bromide

Author keywords

[No Author keywords available]

Indexed keywords

CETRIMIDE; SILICON DIOXIDE;

EID: 0033821358     PISSN: 09599428     EISSN: None     Source Type: Journal    
DOI: 10.1039/b003178j     Document Type: Article
Times cited : (148)

References (27)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.