Nanostructural lithography via photo-initiated phase transformation of silica-surfactant assemblies

Materials Research Society Symposium - Proceedings

Volumn 576, Issue , 1999, Pages 263-268

  Doshi, D A ^a   Husing N ^b   Fan, H ^a   Hurd, A J ^c   Brinker, C J ^c  

^a UNIVERSITY OF NEW MEXICO   (United States)

^b VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

^c SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONDENSATION; ELLIPSOMETRY; ETCHING; NANOSTRUCTURED MATERIALS; OPTICAL MICROSCOPY; PHOTOSENSITIVITY; SCANNING ELECTRON MICROSCOPY; SILICA; SURFACE ACTIVE AGENTS; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION; X RAY CAMERAS;

NANOSTRUCTURAL LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0033357818     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-576-263     Document Type: Conference Paper

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