The true structure of hexagonal mesophase-templated silica films as revealed by X-ray scattering: Effects of thermal treatments and of nanoparticle seeding

Chemistry of Materials

Volumn 12, Issue 6, 2000, Pages 1721-1728

  Klotz, Michaela ^a   Albouy, Pierre Antoine ^b   Ayral, André ^a   Ménager, Christine ^c   Grosso, David ^d   Van Der Lee, Arie ^a   Cabuil, Valérie ^c   Babonneau, Florence ^d   Guizard, Christian ^a  

^a UNIVERSITÉ DE MONTPELLIER   (France)

^b UNIVERSITÉ PARIS SUD   (France)

^c CNRS   (France)

^d UNIVERSITÉ PIERRE ET MARIE CURIE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

FERRIC OXIDE; SILICON DIOXIDE;

ARTICLE; CHEMICAL MODIFICATION; CRYSTAL STRUCTURE; GEOMETRY; HEAT TREATMENT; POROSITY; RADIATION SCATTERING; STRUCTURE ANALYSIS;

EID: 0033799049     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm991198t     Document Type: Article

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