Double-layer inorganic antireflective system for KrF lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 1, 2000, Pages 127-135

  Xu, Min ^a   Ko, Tze Man ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; COMPUTER SIMULATION; EXCIMER LASERS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LASER APPLICATIONS; SILANES;

BOTTOM ANTIREFLECTIVE COATING (BARC); KRYPTON FLUORIDE LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0033719277     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591163     Document Type: Article

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