Titanium oxide film for the bottom antireflective layer in deep ultraviolet lithography

Applied Optics

Volumn 36, Issue 7, 1997, Pages 1482-1486

  Jun, Byung Hyuk ^a   Han, Sang Soo ^a   Kim, Kyong Sub ^a   Lee, Joon Sung ^a   Jiang, Zhong Tao ^a   Bae, Byeong Soo ^a   No, Kwangsoo ^a   Kim, Dong Wan ^b   Kang, Ho Young ^b   Koh, Young Bum ^b  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b SAMSUNG Electronics   (South Korea)

Author keywords

Bottom antirefractive layer; KrF excimer laser; Lithography; Reflectance; Titanium oxide thin film

Indexed keywords

EID: 0006785975     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.36.001482     Document Type: Article

References (15)

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