How to use DUV BARCs over topography

Microlithography World

Volumn 7, Issue 3, 1998, Pages 13-20

  Op de Beeck, Maaike ^a   Vandenberghe, Geert ^a   Jaenen, Patrick ^a   Zhang, Feng Hong ^a   Delvaux, Christie ^a   van Puyenbroeck, Ilse ^a   Ronse, Kurt ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; SUBSTRATES;

DEEP ULTRAVIOLET PROCESSES (DUV);

PHOTOLITHOGRAPHY;

EID: 0032091977     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (10)