A novel antireflection method with gradient photoabsorption for optical lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2726, Issue , 1996, Pages 573-582

  Tanaka, Toshihiko ^a   Asai, Naoko ^a   Uchino, Shou Ichi ^a  

^a HITACHI LTD   (Japan)

Author keywords

Antireflection; BARC; BARL; CD controllability; Lithography; Photolithography

Indexed keywords

ANTIREFLECTION COATINGS; LIGHT ABSORPTION; LIGHT INTERFERENCE; LIGHT REFLECTION; SUBSTRATES;

CRITICAL DIMENSION (CD) CONTROLLABILITY;

PHOTOLITHOGRAPHY;

EID: 0030313133     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240926     Document Type: Conference Paper

References (7)