A multilayer inorganic antireflective system for use in 248 nm deep ultraviolet lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 4229-4233

  Cirelli, R A ^a   Weber, G R ^a   Kornblit, A ^a   Baker, R M ^a   Klemens, F P ^a   DeMarco, J ^a   Pai, C S ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001426921     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588581     Document Type: Article

References (6)

1. C A Mack, Microlithography World 3, 23 (1994).
2. C. F. Lyons, R. K. Leidy, and G. B. Smith, Proc. SPIE 1647 (1992).
3. T. Ogawa, H. Nakano, T. Gocho, and T. Tsumori, Proc. SPIE 2197, 722 (1994).
4. N. Blayo, R. A. Cirelli, F. P. Klemens, and J. T. C. Lee, J. Opt. Soc. Am. 12, 591 (1994).
5. Prolith/2 is a registered trademark of FINLE technologies.
6. ARCH2 is a registered trademark of Olin Microelectronics Manufacturing.