Dry etching of BaSrTiO3 and LaNiO3 thin films in inductively coupled plasmas

Journal of the Electrochemical Society

Volumn 146, Issue 10, 1999, Pages 3778-3782

  Lee, K P ^a   Jung, K B ^a   Srivastava, A ^a   Kumar, D ^a   Singh, R K ^a   Pearton, S J ^a  

^a UNIVERSITY OF FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; BARIUM COMPOUNDS; LANTHANUM COMPOUNDS; PHOTORESISTS; PLASMA ETCHING; THIN FILMS;

BARIUM STRONTIUM TITANATE; INDUCTIVELY COUPLED PLASMAS; LANTHANUM NITRATE;

DIELECTRIC FILMS;

EID: 0033313413     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1392549     Document Type: Article

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