Importance of rapid photothermal processing in defect reduction and process integration

IEEE Transactions on Semiconductor Manufacturing

Volumn 12, Issue 1, 1999, Pages 36-43

  Singh, Rajendra ^a,b   Parihar, Vijay ^b   Chen, Yuanning ^c   Poole, Kelvin F ^b   Nimmagadda, Srikanth V ^d   Vedula, Lakshmi ^e  

^a IEEE   (United States)

^b AMRL   (United States)

^c NOKIA RESEARCH CENTER   (United States)

^d INTEL CORPORATION   (United States)

^e Level One Communications   (United States)

Author keywords

Defect reduction; Manufacturing; Process optimization; Rapid photothermal processing; Rapid thermal processing; Reduction; Reliability; Yield

Indexed keywords

CONSTRAINT THEORY; DEFECTS; INSPECTION; INTEGRATED CIRCUIT MANUFACTURE; MATHEMATICAL MODELS; OPTIMIZATION; PROCESS ENGINEERING; RELIABILITY;

DEFECT REDUCTIONS; RAPID PHOTOTHERMAL PROCESSING;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0033078650     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.744520     Document Type: Article

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