Rapid photothermal processing

Solid State Technology

Volumn 40, Issue 10, 1997, Pages 193-198

  Singh, R ^a,b   Sharangpani, R ^a,b  

^a AMRL   (United States)

^b CLEMSON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

RAPID THERMAL ANNEALING; ULTRAVIOLET SPECTROSCOPY;

RADIATION SPECTRA; RAPID PHOTOTHERMAL PROCESSING;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0004927324     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (13)

1. R. Singh, "Rapid Isothermal Processing," J. Appl. Phys., 63, R59-R114, 1988.
2. K.G. Reid, A.R. Sitaram, "RTP for ULSI Applications: An overview," Solid State Technology, 63, Feb. 1996.
3. A. Dip, "Fast thermal processing: Batch comes back," Solid State Technology, p. 113, June 1996.
4. R. Singh, "A Better Way to Form III-V Junctions," Electronics, 58, 19, Dec. 1985.
5. R. Singh, "New Processes for Junction Formation in Compound Semiconductors by Rapid Isothermal Processing," Semiconductor International, 9 (1), 28, 1986.
6. R. Singh, et al., "Oxidation of Tin on Silicon Substrate by Rapid Isothermal Processing," J. Appl. Phys., 66, 2381, 1989.
7. R. Singh, et al., "Role of Photoeffects in Rapid Isothermal Processing," Appl. Phys. Lett., 1991.
8. R. Singh, "Rapid Isothermal Processing," Handbook of Compound Semiconductors, eds. P. Holloway, G. McGuire, (Noyce Publications, Park Ridge, N.J.), 442, 1995.
9. R. Singh, et al., "How Rapid Isothermal Processing can be a Dominant Semiconductor Processing Technology in the 21 st Century," Mat. Res. Soc. Symp. Proc., eds. J.C. Gelpey, et al., Material Research Society, Pittsburgh, PA, Vol. 429, p. 81, 1996.
10. G.E. Jellison Jr., F. A. Modine, "Optical Functions of Silicon at Elevated Temperatures," J. Appl. Physics, 39, 3758, 1994.
11. R. Sharangpani, K.C. Cherukuri, R. Singh, "Importance of High Energy Photons in the Curing of Spin-on Low Dielectric Constant Interconnect Materials," J. Electrochem. Soc., 144 (2), 669, 1997.
12. T.E. Gentle, "Rapid Thermal and Related Processing Techniques," eds. M.M. Moslehi, R. Singh, D. Kwong, Int. Soc. Opt. Eng., Vol. 133, p. 146, 1991.
13. R. Singh, et al., "Low Temperature Shallow Junction Formation Using Vacuum Ultraviolet Photons In Rapid Isothermal Processing," Appl. Ph. Lett., Vol. 70, p. 1700, 1997.