Role of high energy photons in dual spectral source rapid isothermal CVD

Journal of Electronic Materials

Volumn 26, Issue 10, 1997, Pages 1184-1188

  Singh, R ^a   Chen, Y ^a  

^a AMRL   (United States)

Author keywords

Dielectrics; Metalorganic chemical vapor deposition (MOCVD); Rapid isothermal processing (RIP); Ta2O5

Indexed keywords

ACTIVATION ENERGY; CURRENT DENSITY; CURRENT VOLTAGE CHARACTERISTICS; DIFFUSION IN SOLIDS; LEAKAGE CURRENTS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PHOTOCHEMICAL REACTIONS; PHOTONS; SUBSTRATES; TANTALUM COMPOUNDS; THIN FILMS;

PHOTOPHYSICAL PROCESSES; RAPID ISOTHERMAL PROCESSING;

DIELECTRIC FILMS;

EID: 0031257336     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-997-0017-8     Document Type: Article

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