A computerized direct liquid injection, rapid isothermal processing assisted chemical vapor deposition system for a Teflon amorphous fluoropolymer

Review of Scientific Instruments

Volumn 68, Issue 3, 1997, Pages 1564-1570

  Sharangpani, R ^a   Singh, R ^a  

^a AMRL   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000521933     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1147926     Document Type: Article

References (34)

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