Structure and properties of carbon nitride films deposited by magnetron sputtering

Materials Chemistry and Physics

Volumn 60, Issue 2, 1999, Pages 163-167

  Zheng, Weitao ^a   Ji, Hong ^a   Yu, Wenxue ^a   Li, Haibo ^a   Jin, Zengsun ^a   Wang, Yuming ^a   Sundgren, Jan Eric ^b  

^a JILIN UNIVERSITY   (China)

^b LINKÖPING UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; CARBON INORGANIC COMPOUNDS; ELECTRIC RESISTANCE; ENERGY GAP; HARDNESS; MAGNETRON SPUTTERING; MORPHOLOGY; NITRIDES; SPUTTER DEPOSITION; VAPOR DEPOSITION; X RAY SPECTROSCOPY;

CARBON NITRIDE; NEAR EDGE X RAY ABSORPTION FINE STRUCTURE (NEXAFS) SPECTROSCOPY;

PROTECTIVE COATINGS;

EID: 0032688617     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0254-0584(99)00094-2     Document Type: Article

References (16)

1. Xin H., Lin C., Zou S., Shi X., Zhu H., Hemment P.L.F. Nucl. Instrum. Methods Phys. Res. B. 103:1995;309.
2. Zheng W.T., Sjostrom H., Ivanov I., Xing K.Z., Broitman E., Salaneck W.R., Greene J.E., Sundgren J.-E. J. Vac. Sci. Technol. A. 14:1996;2696.
3. Zheng W.T., Broitman E., Hellgren N., Xing K.Z., Ivanov I., Sjostrom H., Hultman L., Sundgren J.-E. Thin Solid Films. 308 309:1997;223.
4. Zheng W.T., Hellgren N., Sjostrom H., Sundgren J.-E. Surf. Coat. Technol. 100 101:1998;287.
5. Zheng W.T., Sundgren J.-E. Chinese Phys. Lett. 15:1998;120.
6. Zheng W.T., Xing K.Z., Hellgren N., Logdlund M., Johansson A., Gelivs U., Salaneck W.R., Sundgren J.-E. J. Electron. Spectroscopy Relat. Phenom. 87:1997;45.
7. Broitman E., Zheng W.T., Sjostrom H., Ivanov I., Greene J.E., Sundgren J.-E. Appl. Phys. Lett. 72:1998;2532.
8. Zheng W.T., Ding T., Ivanov I., Sundgren J.-E. J. Mater. Sci. Technol. 13:1997;154.
9. Zheng W.T., Sundgren J.-E. J. Mater. Sci. Technol. 14:1998;269.
10. Sjostrom H., Hultman L., Sundgren J.-E., Hainsworth S.V., Page T.F., Thunissen G.S.A.M. J. Vac. Sci. Technol. A. 14:1996;56.
11. Comelli G., Stohr J., Robinson C.J., Jark W. Phys. Rev. B. 38:1988;7511.
12. J. Stohr, NEXAFS Spectroscopy, Springer, New York, 1992.
13. McCulloch D.G., Merchant A.R. Thin Solid Films. 290 291:1996;99.
14. Tauc J. Prog. Semicond. 9:1965;87.
15. Oliver W.C., Pharr G.M. J. Mater. Res. 7:1992;1564.
16. Doerner M.F., Nix W.D. J. Mater. Res. 1:1986;601.