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Volumn 13, Issue 2, 1997, Pages 154-156

Influence of experimental parameters on reactive magnetron sputtering CNx thin films

Author keywords

[No Author keywords available]

Indexed keywords

HARDENING; NITRIDES; SPUTTER DEPOSITION; THIN FILMS;

CARBON NITRIDE FILMS; DEPOSITION RATE; REACTIVE MAGNETRON SPUTTERING;

CARBON;

EID: 0031096797 PISSN: 10050302 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (4)

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