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Journal of Materials Science and Technology

Volumn 14, Issue 3, 1998, Pages 269-272

Reactive magnetron sputtering of CNx thin films on β-Si3N4 substrates

(3) Zheng, W T a,b Hellgren, N a Sundgren, J E a

a LINKÖPING UNIVERSITY (Sweden)

b JILIN UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON INORGANIC COMPOUNDS; MECHANICAL PROPERTIES; MICROSTRUCTURE; NITRIDES; SILICON NITRIDE;

CARBON NITRIDE; REACTIVE MAGNETRON SPUTTERING; SILICON NITRIDE SUBSTRATES;

THIN FILMS;

EID: 0032284929 PISSN: 10050302 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (2)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.