Characterization of carbon nitride thin films deposited by reactive d.c. magnetron sputtering on various substrate materials

Surface and Coatings Technology

Volumn 100-101, Issue 1-3, 1998, Pages 287-290

  Zheng, W T ^a,b   Hellgren, N ^a   Sjostrom H ^a   Sundgren, J E ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b JILIN UNIVERSITY   (China)

Author keywords

Carbon nitride; Magnetron sputtering; Various substrates

Indexed keywords

ADHESION; ATOMIC FORCE MICROSCOPY; CARBON; COMPOSITION EFFECTS; FILM GROWTH; MECHANICAL PROPERTIES; NITROGEN; SPUTTER DEPOSITION; SUBSTRATES; SURFACE STRUCTURE; THIN FILMS;

CARBON NITRIDE;

MAGNETRON SPUTTERING;

EID: 0032026752     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00634-8     Document Type: Article

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