A low temperature ultrahigh vaccum scanning force microscope

Review of Scientific Instruments

Volumn 70, Issue 9, 1999, Pages 3625-3640

  Hug, Hans J ^a   Stiefel, B ^a   Van Schendel, P J A ^a   Moser, A ^a   Martin, S ^a   Guntherodt H J ^a  

^a UNIVERSITY OF BASEL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH TEMPERATURE SUPERCONDUCTORS; LOW TEMPERATURE OPERATIONS; SCANNING;

ULTRAHIGH VACUUM SCANNING FORCE MICROSCOPES;

OPTICAL MICROSCOPY;

EID: 0032613936     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1149970     Document Type: Article

References (122)

1. We give only a few citations as overview: See Refs. 121, 122.
2. Citations are given in the successive text.
3. The LTSFM system described here will be commercially available. It will be produced by Omicron Vakuumphysik GmbH, Idsteiner Str. 78, D-65232 Taunusstein.
4. Mini CryoSTM, exchange gas cooled for temperatures between 1.5 and 300 K, produced by Oxford Instruments, Old Station Way, Eynsham, Witney Oxon, OX8 1TL.
5. UHV Variable Temperture STM, for temperatures between 50 and 1000 K, produced by Oxford Instruments, Old Station Way, Eynsham, Witney Oxon, OX8 1TL.
6. Low Temperature UHV STM, for temperatures around 5 K, produced by Omicron Vakuumphysik GmbH, Idsteiner Strasse 78, D-65232 Taunusstein, Germany.
7. UHV Variable Temperture STM, for temperatures between 25 and 1500 K, produced by Omicron Vakuumphysik GmbH, Idsteiner Strasse 78, D-65232 Taunusstein, Germany.
8. Usually the backside of the cantilever is coated by a thin metallic film to increase the optical reflectivity. Another example is the ferromagnetic coating needed to perform magnetic force microscopy experiments.
9. F. Gießibl, C. Gerber, and G. Binnig, J. Vac. Sci. Technol. 9, 984 (1991).
10. A. Volodin and M. Marchevsky, Ultramicroscopy 42, 757 (1992).
11. T. Albrecht, P. Grütter, D. Rugar, and D. Smith, Ultramicroscopy 42-44, 1638 (1992).
12. H. Hug et al., Rev. Sci. Instrum. 64, 2920 (1993).
13. K. Moloni, B. Moskowitz, and E. Dahlberg, Geophys. Res. Lett. 23, 2851 (1996).
14. R. Euler, U. Memmert, and U. Hartmann, Rev. Sci. Instrum. 68, 1776 (1997).
15. D. Pelekhov, J. B. Becker, and G. N. Nunes, Jr., Appl. Phys. Lett. 72, 993 (1998).
16. W. Allers, A. Schwarz, U. Schwarz, and R. Wiesendanger, Rev. Sci. Instrum. 69, 221 (1997).
17. C. Yuan et al., Appl. Phys. Lett. 10, 1308 (1994).
18. Q. Dai et al., Rev. Sci. Instrum. 66, 5266 (1995).
19. F. Gießibl and G. Binnig, Ultramicroscopy 42-44, 281 (1992).
20. H. Hug, T. Jung, and H.-J. Güntherodt, Rev. Sci. Instrum. 63, 3900 (1992).
21. D. Rugar et al., Rev. Sci. Instrum. 59, 2337 (1988).
22. D. Rugar, H. Mamin, and P. Guethner, Appl. Phys. Lett. 55, 2588 (1989).
23. It should be noted that Rugar et al. still use a similar LTSFM for their extremely successful work on electron and nuclear spin resonance detection by magnetic force microscopy.
24. A. Moser et al., Meas. Sci. Technol. 4, 769 (1993).
25. H. Hug et al., Physica B 194-196, 377 (1994).
26. A. Moser et al., J. Vac. Sci. Technol. B 12, 1586 (1994).
27. A. Moser et al., Phys. Rev. Lett. 74, 1847 (1995).
28. H. Hug et al., Physica C 235-240, 2695 (1994).
29. H. Hug et al., in Forces in Scanning Probe Methods, edited by H.-J. Güntherodt, D. Anselmetti, and E. Meyer, NATO ASI Series E: Applied Sciences (Kluwer, Dordrecht, 1995), Vol. 286.
30. Private communication, D. P. E. Smith, NATO ASI on Scanning Force Microscopy, Schluchsee, Germany, 1994.
31. A. Volodin and C. van Haesendonck, Appl. Phys. Lett. 73, 1134 (1998).
32. C. Yuan et al., J. Vac. Sci. Technol. B 14, 1210 (1996).
33. Q. Lu, C.-C. Chen, and A. Lozanne, Science 276, 2006 (1997).
34. -4 N/m) might be too small to detect the stray field of single vortices. Furthermore, none of the tests proposed in Ref. 119 have been presented.
35. A. Volodin, K. Temst, C. van Haesendonck, and Y. Bruynserasede, Appl. Phys. A: Solids Surf. (submitted).
36. C. Prater et al., J. Vac. Sci. Technol. B 9, 989 (1991).
37. T. Albrecht, P. Grütter, D. Horne, and D. Rugar, J. Appl. Phys. 69, 668 (1991).
38. This is necessary if the microscope has to be operated in fields up to 7 T.
39. So far only one other LTSFM exists which is operated in the center of a superconducting magnet and has a xy-positioning device for the relative position of the cantilever with respect to the sample.
40. H. Hug et al. Omicron Newsletter 2, Scientific Article (1998).
41. http://www.omicron.de/products/cryo_sfm/, 1998.
42. http://physics.nist.gov/Divisions/Div841/Gp3/epg_files/stm_lt_uhv.html, 1998.
43. http://www.pc.chemie.uni-siegen.de/lieb/instrument.html.en, 1998.
44. J. A. Heimberg et al., Phys.-Techn. Bundesanstalt PTB-F-30, 25 (1997).
45. Mechanical Hand (MH Series) from Vacuum Generators (VG), MEILI-Kryotech, Conradin-Zschokke Strasse 10, CH-5312 Döttingen, Switzerland, 1997.
46. The cantilever runs from the -Y to the + Y-direction.
47. The wall also supports the electrical connectors of the instrument.
48. Micro Slide Control Unit, Omicron Vakuumphysik GmbH, Idsteiner Strasse 78, D-65232 Taunusstein, Germany, 1998.
49. S. Jarvis, A. Oral, T. Weihs, and J. Pethica, Rev. Sci. Instrum. 64, 3515 (1993).
50. J. Gimzewski, C. Gerber, E. Meyer, and R. Schlittler, Chem. Phys. Lett. 217, 589 (1994).
51. E. Meyer, J. K. Gimzewski, Ch. Gerber, and R. R. Schlittler, Micromechanical Calorimeter with Picojoule Sensitivity, edited by M. E. Weiland and J. K. Gimzewski (Kluwer, Dordrecht, 1995), p. 89.
52. R. Berger et al., Appl. Phys. Lett. 69, 40 (1996).
53. HPT Translator from Vacuum Generators (VG), MEILI-Kryotech, Conradin-Zschokke Strasse 10, CH-5312 Döttingen, Switzerland, 1997.
54. ISE 10 Sputter Cleaning Ion Source, Omicron Vakuumphysik GmbH, Idsteiner Strasse 78, D-65232 Taunusstein, Germany, 1997.
55. Triple EFM, 3-cell UHV Evaporator, Omicron Vakuumphysik GmbH, Idsteiner Strasse 78, D-65232 Taunusstein, Germany, 1997.
56. This keeps the length of all wires and the optical fiber constant during the vertical translation of the SFM.
57. These clamps are also needed to remove the load from the spring suspension of the SFM when the system is baked.
58. L. Salerno, P. Kittel, and A. Spivak, AIAA J. 22, 1810 (1984).
59. K.-H. Yoo and A. Anderson, Cryogenics 23, 531 (1983).
60. We normally use a separate laboratory turbomolecular pumping system for this purpose.
61. KF means Klammerflansch according to the product catalogue of Balzers.
62. Oxygen free high conductivity copper.
63. Cryostat, custom-made for Dr. H. J. Hug by Oxford Instruments, Old Station Way, Eynsham, Witney Oxon, OX8 1TL, 1993.
64. The definition of OFHC is oxygen free high conductivity copper.
65. Note that the bottom part of the UHV tube cannot be made solely from an electrically well conducting material since an accidental quench of the superconducting magnet would then induce high Eddy currents which may crush the SFM section.
66. This temperature is measured with the temperature sensor described in Sec. II A 3.
67. 2 is used as a coolant.
68. In the future we plan to reach an even lower base temperature by modifying the baffles of the cryostat insert to lower the heat load onto the cones.
69. K. Jülich Ferienkurs, Magnetisimus von Festkörpern und Grenzflächen (Springer, New York, 1993).
70. MagLab-CMP, a cantilever magnetometer system, produced by Oxford Instruments, Old Station Way, Eynsham, Witney Oxon, OX8 1TL.
71. H. J. Hug et al., Rev. Sci. Instrum. 64, 2920 (1993).
72. H. Hug et al., Physica B 12, 1591 (1994).
73. Note that this is rather trivial for contact measurements since they usually rely on the strong repulsive force between tip and sample. However in noncontact measurements, the z derivative, may change sign. When the sign of the z derivative of the interaction force changes, the feedback system tries to correct an error by changing the tip-to-sample distance into the wrong direction.
74. C. Loppacher et al., Appl. Phys. A: Solids Surf. 66, 215 (1998).
75. Note that the precision of the exchange mechanism is of crucial importance for the cantilever. The cantilever is adjusted on its holder ex situ by means of a dummy stage. Afterwards the cantilever holder is mounted into the SFM without further coarse adjustments.
76. CAMST Topical Meeting on Magnetic Force Microscopy (MESA Research Institute, The Netherlands, 1995).
77. M. Rührig et al., J. Appl. Phys. 79, 2913 (1996).
78. H. J. Hug et al., J. Appl. Phys. 83, 5609 (1998).
79. The frequency was chosen to be high enough not to disturb the static measurement of the cantilever deflection which was acquired in the 0-500 Hz frequency band.
80. J. Akia and S. Wadhwa, Rev. Sci. Instrum. 66, 2517 (1995).
81. R. Emch, P. Descouts, and P. Niedermann, J. Microsc. 152, 85 (1988).
82. T. Jung, Ph.D. thesis, Universität Basel, 1992.
83. T. Yokohata, S. Hara, R. Kaneko, and K. Kato, Jpn. J. Appl. Phys., Part 1, 33, 1209 (1994).
84. E. Riis et al., Appl. Phys. Lett. 54, 2530 (1989).
85. N. Tamer and M. Dahleh, Proceedings of the 33rd Conference on Decision and Control 2, 1826 (1994).
86. K. Vandervoort, R. Zasadzinski, G. Galicia, and G. Crabtree, Rev. Sci. Instrum. 64, 896 (1993).
87. M. Locatelli and G. Lamboley, Rev. Sci. Instrum. 59, 661 (1988).
88. True Metrix, real-time closed loop correction for piezo scanner nonlinearities, Trademark of TopoMetrix Corporation, 5403 Betsy Ross Drive, Santa Clara, CA 95054-1162.
89. L. Hadjiiski, S. Münster, E. Oesterschulze, and R. Kassing, J. Vac. Sci. Technol. B 14, 1563 (1996).
90. C. Cai, X. Chen, Q. Shu, and X. Zheng, Rev. Sci. Instrum. 63, 5649 (1992).
91. max is the corresponding Voltage applied to the scanner.
92. scan.
93. We use an EBL2 scanner with an outer diameter of 12.7 mm and a length of 38.1 mm.
94. The calibration standard is an etched silicon wafer, which has quadratic etch pits arranged in a quadratic lattice. The pits have a sidelength of 100 nm, a spacing of 200 nm, and a depth of 70 nm.
95. For instance ±100 V means that bipolar voltages are applied to opposite segments of the piezo scanner, resulting in a total voltage difference of 200 V.
96. This is also the case if one interchanges the fast and the slow scan directions. In fact we found no assymetry between the x- and y-piezo electrodes.
97. C. Heer, Statistical Mechanics, Kinetic Theory, and Stochastic Processes (Academic, New York, 1992).
98. T. Albrecht, P. Grütter, D. Home, and D. Rugar, J. Appl. Phys. 69, 668 (1991).
99. T. Stowe et al., Appl. Phys. Lett. 71, 288 (1997).
100. D. Rugar, C. Yannoni, and J. Sidles, Nature (London) 360, 563 (1992).
101. J. Sidles and D. Rugar, Phys. Rev. Lett. 70, 3506 (1993).
102. O. Züger and D. Rugar, Appl. Phys. Lett. 63, 2496 (1993).
103. K. Wago et al., J. Vac. Sci. Technol. B 14, 1197 (1996).
104. l=2.5 N/m, T=6 K and Q=3000).
105. Nanosensors, Dr. Olaf Wolter GmbH, IMO-Building, Im Amtmann 6, D-35578 Wetzlar-Blankenfeld, Germany.
106. M. Bammerlin, Master's thesis, Universität Basel, 1995.
107. M. Nonnemacher, Ph.D. thesis, Universität Sindelfingen, 1990.
108. F. Gießibl, Science 267, 68 (1995).
109. P. Güthner, J. Vac. Sci. Technol. B 14, 2428 (1995).
110. S. Kitamura and M. Iwatsuki, Jpn. J. Appl. Phys., Part 1, 34, 145 (1995).
111. H. Ueyama, M. Ohta, Y. Sugawara, and S. Morita, Jpn. J. Appl. Phys., Part 1, 34, 1086 (1995).
112. R. Luethi et al., Z. Phys. B 100, 165 (1996).
113. S. Kitamura and M. Iwatsuki, Jpn. J. Appl. Phys., Part 1, 35, 668 (1996).
114. L. Olsson, R. Wigren, and R. Erlandson, Rev. Sci. Instrum. 67, 8309 (1996).
115. G. Bochi et al., Phys. Rev. Lett. 75, 1839 (1995).
116. H. Hug et al., J. Appl. Phys. 79, 5609 (1996).
117. The total time per scanline, i.e., for forward plus backward movement.
118. A. Moser, H. Hug, B. Stiefel, and H.-J. Güntherodt, J. Magn. Magn. Mater. 190-192, 114 (1998).
119. B. Dam et al., Physica C 261, 4 (1996).
120. D. Eigler and E. Schweizer, Nature (London) 344, 524 (1990).
121. H. Hess et al., J. Vac. Sci. Technol. A 8, 450 (1990).
122. G. Meyer, Rev. Sci. Instrum. 67, 2960 (1996).