Characterization of vapor deposition polymerized polyimide thin films

Journal of Polymer Science, Part B: Polymer Physics

Volumn 34, Issue 13, 1996, Pages 2239-2246

  Jou, Jwo Huei ^a   Cheng, Chien Li ^a   Jou, Emily Chin Yi ^a   Yang, Arnold Chang Mou ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Characterization; Polyimide; Surface topology; Vapor deposition polymerization

Indexed keywords

ATOMIC FORCE MICROSCOPY; CURING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; POLYIMIDES; POLYMERIZATION; RESIDUAL STRESSES; SCANNING ELECTRON MICROSCOPY; SURFACE STRUCTURE; THERMAL CYCLING; THERMODYNAMIC STABILITY; THERMOGRAVIMETRIC ANALYSIS; VAPOR DEPOSITION;

BENDING BEAM TECHNIQUES; HYGROSCOPIC STRESS; IMIDIZATION CHARACTERISTICS; MOISTURE DIFFUSION; PYROMELLITIC DIANHYDRIDE OXYDIANILINE; SURFACE TOPOLOGY; WET ETCHING CHARACTERISTICS;

THIN FILMS;

EID: 0004661945     PISSN: 08876266     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1099-0488(19960930)34:13<2239::AID-POLB13>3.0.CO;2-6     Document Type: Article

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