Improved electron-beam patterning of Si with self-assembled monolayers

Applied Physics Letters

Volumn 69, Issue 27, 1996, Pages 4245-4247

  Whelan, C S ^a   Lercel, M J ^a   Craighead, H G ^a   Seshadri, K ^b   Allara, D L ^b  

^a Department of Materials Science and Engineering   (United States)

^b PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000606307     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116959     Document Type: Article

References (9)

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