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Volumn 45, Issue 6 PART 1, 1998, Pages 2500-2508

Breakdown of gate oxides during irradiation with heavy ions

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; CRYSTAL DEFECTS; ELECTRIC BREAKDOWN OF SOLIDS; ELECTRIC FIELDS; ENERGY TRANSFER; HEAVY IONS; ION BOMBARDMENT; OXIDES; RADIATION EFFECTS; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR DEVICE TESTING;

EID: 0032319589     PISSN: 00189499     EISSN: None     Source Type: Journal    
DOI: 10.1109/23.736491     Document Type: Article
Times cited : (64)

References (17)
  • 6
    • 33747231653 scopus 로고    scopus 로고
    • chapter 1 in Submicron Integrated Circuits, R. K Watts (Ed.), New York: John Wiley, 1989.
    • J. L. Brews, K. K. Ng and R. K. Watts, The Submicron Silicon MOSFET, chapter 1 in Submicron Integrated Circuits, R. K Watts (Ed.), New York: John Wiley, 1989.
    • The Submicron Silicon MOSFET
    • Brews, J.L.1    Ng, K.K.2    Watts, R.K.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.