-
1
-
-
0028710490
-
-
IEEE Trans. Nucl. Sei., 41, p. 2043, December 1994.
-
G. M. Swift, D. J. Padgett, and A. H. Johnston, A New Class of Single Event Hard Errors, IEEE Trans. Nucl. Sei., 41, p. 2043, December 1994.
-
A New Class of Single Event Hard Errors
-
-
Swift, G.M.1
Padgett, D.J.2
Johnston, A.H.3
-
2
-
-
0029454733
-
-
RADECS95 Proceedings, IEEE Pub. 95TH8147, p. 425, 1995.
-
G. Swift and R Katz, An Experimental Survey of Heavy Ion Induced Dielectric Rupture in Actel Field Programmable Gate Arrays (FPGAs), RADECS95 Proceedings, IEEE Pub. 95TH8147, p. 425, 1995.
-
An Experimental Survey of Heavy Ion Induced Dielectric Rupture in Actel Field Programmable Gate Arrays (FPGAs)
-
-
Swift, G.1
Katz, R.2
-
3
-
-
0031386902
-
-
IEEE Trans. Nucl. Sei., 44, p. 2345, December 1997.
-
F. W. Sexton, D. M Fleetwood, M. R. Shaneyfelt, P. E. Dodd and G. L. Hash., Single Event Gate Rupture in Thin Gate Oxides, IEEE Trans. Nucl. Sei., 44, p. 2345, December 1997.
-
D. M Fleetwood, M. R. Shaneyfelt, P. E. Dodd and G. L. Hash., Single Event Gate Rupture in Thin Gate Oxides
-
-
Sexton, F.W.1
-
5
-
-
0028697670
-
-
IEEE Trans. Nucl. Sei., 41., p. 2005, December 1994.
-
P. E. Dodd, F. W. Sexton and P. S. Winokur, ThreeDimensional Simulation of Charge Collection and MultipleBit Upset in Si Devices, IEEE Trans. Nucl. Sei., 41., p. 2005, December 1994.
-
ThreeDimensional Simulation of Charge Collection and MultipleBit Upset in Si Devices
-
-
Dodd, P.E.1
Sexton, F.W.2
Winokur, P.S.3
-
6
-
-
33747231653
-
-
chapter 1 in Submicron Integrated Circuits, R. K Watts (Ed.), New York: John Wiley, 1989.
-
J. L. Brews, K. K. Ng and R. K. Watts, The Submicron Silicon MOSFET, chapter 1 in Submicron Integrated Circuits, R. K Watts (Ed.), New York: John Wiley, 1989.
-
The Submicron Silicon MOSFET
-
-
Brews, J.L.1
Ng, K.K.2
Watts, R.K.3
-
8
-
-
0032003014
-
-
IEEE Trans. Elect. Dev.. 45, p. 472, February 1998.
-
R. Degraeve, J. L. Ogier, R. Bellens, P. J. Roussel, G. Groeseneken, and H. E. Maes, A New Model for the Field Dependence of Intrinsic and Extrinsic Time Dependent Breakdown, IEEE Trans. Elect. Dev.. 45, p. 472, February 1998.
-
J. L. Ogier, R. Bellens, P. J. Roussel, G. Groeseneken, and H. E. Maes, A New Model for the Field Dependence of Intrinsic and Extrinsic Time Dependent Breakdown
-
-
Degraeve, R.1
-
9
-
-
0008536196
-
-
IEEE Trans. Elect. Dev.. 45, p. 904, April 1998.
-
R. Degraeve, G. Groeseneken, R. Bellens, J-L. Ogier, M. Depas, P. J. Roussel and H. E. Maes, New Insights in the Relation Between Electron Trap Generation and the Statistical Properties of Oxide Breakdown, IEEE Trans. Elect. Dev.. 45, p. 904, April 1998.
-
G. Groeseneken, R. Bellens, J-L. Ogier, M. Depas, P. J. Roussel and H. E. Maes, New Insights in the Relation between Electron Trap Generation and the Statistical Properties of Oxide Breakdown
-
-
Degraeve, R.1
-
10
-
-
33747256865
-
-
Solid St. Elect., 41., No. 7, p. 957, 1997.
-
D. J. Demada, Defect Properties and Breakdown of Silicon Dioxide Films, Solid St. Elect., 41., No. 7, p. 957, 1997.
-
Defect Properties and Breakdown of Silicon Dioxide Films
-
-
Demada, D.J.1
-
12
-
-
0030242886
-
-
IEEE Trans. Elect. Dev., 43, p. 1496, September 1996.
-
M. Depas, T, Nigam and M. Heyns, Soft Breakdown of Ultra-Thin Gate Oxide Layers, IEEE Trans. Elect. Dev., 43, p. 1496, September 1996.
-
T, Nigam and M. Heyns, Soft Breakdown of Ultra-Thin Gate Oxide Layers
-
-
Depas, M.1
-
13
-
-
84886448127
-
-
1997 IEDM Proceedings, p. 73.
-
B. Weir, P. I Silverman, D.Monroe, K. S. Krisch, M. A. Alam, G. B. Alers, T. W. Sorsch, G. L. Timp, F. Baumann, C. T. Liu, Y. Ma and D. Hwang, Ultra-Thin Gate Dielectrics: They Break Down, but Do They Fail?, 1997 IEDM Proceedings, p. 73.
-
P. i Silverman, D.Monroe, K. S. Krisch, M. A. Alam, G. B. Alers, T. W. Sorsch, G. L. Timp, F. Baumann, C. T. Liu, Y. Ma and D. Hwang, Ultra-Thin Gate Dielectrics: They Break Down, but Do They Fail?
-
-
Weir, B.1
-
14
-
-
0032028948
-
-
IEEE Trans. Elect. Dev., 45, p. 691. May 1998.
-
H. S. Momose, S. Nakamura, T. Ohguro, T. Yoshitomi, E. Morifuji, T. Morimoto, Y. Katsumata and H. Iwai, Study of the Manufacturing Feasibility of 1.5 nm Direct-Tunneling Gate Oxide MOSFETs, IEEE Trans. Elect. Dev., 45, p. 691. May 1998.
-
S. Nakamura, T. Ohguro, T. Yoshitomi, E. Morifuji, T. Morimoto, Y. Katsumata and H. Iwai, Study of the Manufacturing Feasibility of 1.5 Nm Direct-Tunneling Gate Oxide MOSFETs
-
-
Momose, H.S.1
-
16
-
-
0030370401
-
-
IEEE Trans. Nucl. Sei., 43, p.2932, December 1996.
-
G. I. Johnson, K. F. Galloway, R. D. Schrimpf, J. L. Titus, C. F. Wheatley, M. Allenspach and C. Dachs, A Physical Interpretation for the Single-Event-Gate Rupture Cross Section of N-Channel Power MOSFETs, IEEE Trans. Nucl. Sei., 43, p.2932, December 1996.
-
K. F. Galloway, R. D. Schrimpf, J. L. Titus, C. F. Wheatley, M. Allenspach and C. Dachs, A Physical Interpretation for the Single-Event-Gate Rupture Cross Section of N-Channel Power MOSFETs
-
-
Johnson, G.I.1
-
17
-
-
33947379903
-
-
1997 IEDM Technical Digest, p. 33.
-
H. Ishiuchi, T. Yoshida, H. Takato, K. Tomioka, K. Matsuo, H. Momose, S. Sawada, K. Yamazaki and K. Maeguchi, Embedded DRAM Technologies, 1997 IEDM Technical Digest, p. 33.
-
T. Yoshida, H. Takato, K. Tomioka, K. Matsuo, H. Momose, S. Sawada, K. Yamazaki and K. Maeguchi, Embedded DRAM Technologies
-
-
Ishiuchi, H.1
|