SiOF film deposition using FSi(OC2H5)3 gas in a helicon plasma source

Journal of the Electrochemical Society

Volumn 145, Issue 7, 1998, Pages 2576-2580

  Yun, Seok Min ^a   Chang, Hong Young ^a,c   Lee, Kwang Man ^b   Kim, Doo Chul ^b   Choi, Chi Kyu ^b,c  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Jeju National University   (South Korea)

^c ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; ELECTRON DENSITY MEASUREMENT; EMISSION SPECTROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MAGNETIC FIELD MEASUREMENT; PLASMA DENSITY; PLASMA SOURCES; PRESSURE MEASUREMENT; SILICON COMPOUNDS; SILICON WAFERS; X RAY PHOTOELECTRON SPECTROSCOPY;

OPTICAL EMISSION SPECTROSCOPY (OES);

DIELECTRIC FILMS;

EID: 0032123672     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838683     Document Type: Article

References (32)

1. T. Homma, Y. Murao, and R. Yamaguchi, J. Electrochem. Soc., 140, 687 (1993).
2. T. Homma, Y. Murao, and R. Yamaguchi, J. Electrochem. Soc., 140, 3599 (1993).;
3. T. Homma, J. Non-Cryst. Solids, 187, 49 (1995).
4. T. Homma, J. Electrochem. Soc., 143, 707 (1996).
5. T. Usami, K. Shimokawa, and M. Yoshimaru, Jpn. J. Appl. Phys., 33, 408 (1994).
6. B. Hwang, J. Choi, S. Lee, K. Fujihara, U. Chung, S. Lee, and M. Lee, Jpn. J. Appl. Phys., 35, 1488 (1996).
7. H. Kitoh, M. Muroyama, M. Sasaki, M. Iwasawa, and H. Kimura, Jpn. J. Appl. Phys., 35, 1464 (1996).
8. S. Lim, Y. shimogake, Y. Nakano, K. Tada, and H. Komiyama, Jpn. J. Appl. Phys., 35, 1468 (1996).
9. S. Lim, Y. Shimogake, Y. Nakano, K. Tada, and H. Komiyama, Appl. Phys. Lett., 68, 832 (1996).
10. S. Lee, M. Park, K. Park, J. Bark, and J. Jang, Jpn. J. Appl. Phys., 35, 1579 (1996).
11. B. Yu, K. Kim, K. Suh, and J. Baek, Jpn. J. Appl. Phys., 35, L 745 (1996).
12. C. Yeh, C. Chen, and G. Lin, J. Electrochem. Soc., 141, 3177 (1993).
13. M. V. Bazylenko, M. Gross, P. M. Allen, and P. L. Chu, IEEE Photonics Technol. Lett., 7, 774 (1995).
14. S. Mizuno, A. Verma, H. Tran, P. Lee, and B. Nguyen, Thin Solid Films, 283, 30 (1996).
15. S. Takeishi, H. Kudoh, R. Shinohara, A. Tsukune, Y. Satoh, H. Miyazawa, H. Harada, and M. Yamada, J. Electrochem. Soc., 143, 381 (1996).
16. H. Kudo, R. Shinohara, S. Takeishi, N. Awaji, and M. Yamada, Jpn. J. Appl. Phys., 35, 1583 (1996).
17. P. Lee, S. Mizuno, A. Verma, H. Tran, and B. Nguyen, J. Electrochem. Soc., 143, 2015 (1996).
18. S. Lee and J. Park, J. Appl. Phys., 80, 5260 (1996).
19. J. Kim, S. Seo, S. Yun, and H. Chang, K. Lee, and C. Choi, J. Appl. Phys., 68, 1507 (1996).
20. J. Kim, S. Seo, S. Yun, H. Chang, K. Lee, and C. Choi, J. Electrochem. Soc., 143, 2990 (1996).
21. K. Endo and T. Tatsumi, Appl. Phys. Lett., 78, 1370 (1995).
22. K. Endo and T. Tatsumi, Appl. Phys. Lett., 68, 2864 (1996).
23. D. Kim, Y. Lee, and N. Park, Appl. Phys. Lett., 69, 2776 (1996).
24. S. Gorbatkin and L. Berry, J. Vac. Sci. Technol., 10, 3104 (1992).
25. K. Seaward, J. Turner, K. Nauka, and A. Nel, J. Vac. Sci. Technol., 13, 118 (1995).
26. E. Korczynski, Solid State Technol., 63 (April 1996).
27. J. Kim and H. Chang, Phys. Plasmas, 3, 1462 (1996).
28. F. Chen and C. Decker, Plasma Phys. Controlled Fusion, 34, 635 (1992).
29. F. Chen and C. Decker, Plasma Phys. Controlled Fusion, 34, 635 (1992).
30. P. Zhu and R. Boswell, Phys. Fluids B, 3, 869 (1991).
31. D. Back, Physics of Thin Films, M. H. Francombe and J. L. Vossen, Editors, Vol. 18, Chap. 1, Academic Press, Inc., New York (1991).
32. H. Miyamima, R. Katsumata, Y. Nakasaki, Y. Nishiyama, and N. Hayasaka, Jpn. J. Appl. Phys., 35, 6217 (1996).