Furnace gas-phase chemistry of silicon oxynitridation in N2O

Applied Physics Letters

Volumn 68, Issue 12, 1996, Pages 1696-1698

  Ellis, K A ^a   Buhrman, R A ^a  

^a Cornell University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000720549     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.115909     Document Type: Article

References (16)

1. W. Ting, H. Hwang, J. Lee, and D. L. Kwong, Appl. Phys. Lett. 57, 2808 (1990).
2. E. C. Carr and R. A. Buhrman, Appl. Phys. Lett. 63, 54 (1994).
3. T. Aoyama, K. Suzuki, H. Tashiro, T. Toda, T. Yamazaki, Y. Arimoto, and T. Ito, J. Electrochem. Soc. 140, 3624 (1993).
4. P. J. Tobin, Y. Okada, S. A. Ajuria, V. Lakhotia, W. A. Feil, and R. I. Hedge, J. Appl. Phys. 75, 1811 (1994).
5. K. Jones, Comprehensive Inorganic Chemistry (Pergamon, Oxford, 1973), Vol. 2, p. 350.
6. W. A. Rosser and H. Wise, J. Chem. Phys. 24, 493 (1956).
7. E. Briner, Ch. Meiner, and A. Rothen, J. Chim. Phys. 23, 609 (1926).
8. C. N. Hinshelwood and F. J. Lindars, Proc. R. Soc. London Ser. A 231, 162
9. F. Kaufman, N. J. Gerri, and R. E. Bowman, J. Chem. Phys. 25, 106 (1956).
10. F. F. Musgrave and C. N. Hinshelwood, Proc. R. Soc. London Ser. A 168, 23 (1923).
11. Z.-Q. Yao, H. B. Harrison, S. Dimitrijev, D. Sweatman, and Y. T. Yeow, Appl. Phys. Lett. 64, 3584 (1994).
12. M. L. Green, D. Brasen, L. C. Feldman, W. Lennard, and H.-T. Tang, Appl. Phys. Lett. 67, 1600 (1995).
13. T. S. Chao, W. H. Chen, S. C. Sun, and H. Y. Chang, J. Electrochem. Soc. 140, L160 (1993).
14. K. Jones, Comprehensive Inorganic Chemistry (Pergamon, Oxford, 1973), Vol. 2, p. 354.
15. N. S. Saks, D. I. Ma, and W. B. Fowler, Appl. Phys. Lett. 67, 374 (1995).
16. E. C. Carr, K. A. Ellis, and R. A. Buhrman, Appl. Phys. Lett. 66, 1492 (1995).