BCl3/N2 dry etching of InP, InAIP, and InGaP

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 3, 1996, Pages 1758-1763

  Ren, F ^a   Lothian, J R ^a   Kuo, J M ^a   Hobson, W S ^a   Lopata, J ^a   Caballero, J A ^b   Pearton, S J ^b   Cole, M W ^c  

^a LUCENT TECHNOLOGIES   (United States)

^b UNIVERSITY OF FLORIDA   (United States)

^c U S ARMY RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0043110243     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (20)

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