Chlorine-based plasma etching of GaN

Materials Research Society Symposium - Proceedings

Volumn 449, Issue , 1997, Pages 969-980

  Shul, R J ^a   Briggs, R D ^a   Pearton, S J ^a   Vartuli, C B ^a   Abernathy, C R ^a   Lee, J W ^a   Constantine, C ^a   Barratt, C ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE; ELECTRON CYCLOTRON RESONANCE; LIGHT EMITTING DIODES; PLASMAS; SEMICONDUCTING GALLIUM COMPOUNDS; SEMICONDUCTOR LASERS;

CHLORINE-BASED PLASMA; ETCH RATE; INDUCTIVELY COUPLED PLASMA; NITRIDE SEMICONDUCTORS;

PLASMA ETCHING;

EID: 0030685951     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (32)