Modeling of optical images in resists by vector potentials

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 1674, Issue , 1992, Pages 637-649

  Tanabe, Hiroyoshi ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC FIELDS; GEOMETRICAL OPTICS; MAXWELL EQUATIONS; PERTURBATION TECHNIQUES;

BLEACHING PROCESS; OPTICAL IMAGE; PERTURBATION THEORY; VECTOR POTENTIAL;

LITHOGRAPHY;

EID: 85027173659     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.130360     Document Type: Conference Paper

References (9)

1. J. Gamelin, R. Guerrieri, and A. R. Neureuther, J. Vac. Sci. Technol. B7, 1984 (1989);
2. K. Tadios, A. Neureuther, J. Gamelin, and R. Guerrier, SPIE 1264, 322 (1990).
3. M. S. Yeung, SPIE 1264, 309 (1990).
4. T. Matsuzawa, A. Moniwa, N. Hasegawa, and H. Sunami, IEEE Trans. CAD 6, 446 (1987).
5. H. P. Urbach and D. A. Bernard, SPIE 1264, 278 (1990);
6. E. Barouch, B. Bradie, U. Hollerbach, G. Karniadakis, and S. Orszag, SPIE 1264, 334 (1990).
7. C.-M. Yuan, J. S. Shaw, and W. Hopewell, SPIE 1088, 392 (1989).
8. D. Nyyssonen and C. P. Kirk, J. Opt. Sci. Am. A5, 1270 (1988).
9. P. Yeh, Optical Waves in Layered Media, (Wiley, 1988).