Optical Lithography

IEEE Transactions on Electron Devices

Volumn 22, Issue 7, 1975, Pages 440-444

  Dill, Frederick H ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTORESISTS;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0016528413     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/T-ED.1975.18158     Document Type: Article

References (6)

1. H. I. Smith, “Fabrication techniques for surface acoustic wave and thin film optical devices,” Proc. IEEE, pp. 1361-1387, Oct. 1974.
2. D. R. Herriott, R. J. Collier, D. S. Alles, and J. W. Stafford, “EBES, a practical electron lithographic system,” IEDM Tech. Dig., Washington, D. C., Dec. 1974, pp. 21-22.
3. J. H. Scheutze and K. E. Hennings, “Large-area masking with patterns of micron and submicron element size,” Solid-State Technol., vol. 9, pp. 31-35, July 1966.
4. C. V. Shank and R. V. Schmidt, “Optical technique for producing 0.1- µ m periodic surface structures,” Appl. Phys. Lett., vol. 23, pp. 154-155, Aug. 1973.
5. S. Middelhoek, “Projection masking, thin photoresist layers, and interference effects,” IBM J. Res. Develop., vol. 14, pp. 117-124, Mar. 1970.
6. A. R. Neureuther and F. H. Dill, “Photoresist modeling and device vice fabrication applications,” Proc. Microwave Research Institute Symposium XVIII, New York, N. Y., Apr. 1974.