Efficient Light Scattering Modeling for Alignment, Metrology, and Resist Exposure in Photolithography

IEEE Transactions on Electron Devices

Volumn 39, Issue 7, 1992, Pages 1588-1598

  Yuan, Chi Min ^a  

^a IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT--SCATTERING; WAVEGUIDES--MATHEMATICAL MODELS;

RESIST BLEACHING PROBLEMS;

LITHOGRAPHY;

EID: 0026899494     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/16.141223     Document Type: Article

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