Reduction of Photoresist Standing-Wave Effects by Post-Exposure Bake

IEEE Transactions on Electron Devices

Volumn 22, Issue 7, 1975, Pages 464-466

  Walker, Edward John ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTORESISTS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0016523047     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/T-ED.1975.18162     Document Type: Article

References (3)

1. E. J. Walker, “Optical interference effects on linewidth in positive photoresist films,” J. Electrochem. Soc., extended abstracts of the Spring, 1974 meeting, San Francisco, Abstract 33.
2. S. Middelhoek, “Projection masking, thin photoresist layers and interference effects, IBM J. Res. Develop., vol. 14, p. 117, 1970.
3. F. H. Dill et al., “Modeling projection printing of positive photoresists,” resists,” IEEE Trans. Electron Devices, this issue, pp. 456-464.