Massively Parallel Electromagnetic Simulation for Photolithographic Applications

IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems

Volumn 14, Issue 10, 1995, Pages 1231-1240

  Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b UNIVERSITY OF BOLOGNA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER ARCHITECTURE; COMPUTER SIMULATION; CONVERGENCE OF NUMERICAL METHODS; ELECTROMAGNETIC WAVE POLARIZATION; FINITE DIFFERENCE METHOD; MASKS; PHASE SHIFTERS; PHOTOLITHOGRAPHY; TIME DOMAIN ANALYSIS;

MASSIVELY PARALLEL ELECTROMAGNETIC SIMULATION; OPTICAL LITHOGRAPHY; PHYSICAL SCATTERING PHENOMENA; PLANE WAVE EXPANSION METHOD; TIME DOMAIN FINITE DIFFERENCE METHOD; TRANSVERSE ELECTRIC; TRANSVERSE MAGNETIC;

ELECTROMAGNETIC WAVE SCATTERING;

EID: 0029391750     PISSN: 02780070     EISSN: 19374151     Source Type: Journal    
DOI: 10.1109/43.466339     Document Type: Article

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