Three-dimensional simulation of optical lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 1463, Issue , 1991, Pages 356-367

  Toh, Kenny K ^a   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUITS--FABRICATION; LITHOGRAPHY--PHOTOLITHOGRAPHY; MATHEMATICAL TECHNIQUES--ALGORITHMS; PHOTORESISTS--PROCESSING;

COMBINED RAY STRING ALGORITHM; MASK PATTERNS; OPAQUE DEFECT; RESIST PROFILES; SOFTWARE PACKAGE SAMPLE 3D;

LITHOGRAPHY;

EID: 0026368443     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)