Simulation of Focus Effects in Photolithography

IEEE Transactions on Semiconductor Manufacturing

Volumn 1, Issue 3, 1988, Pages 85-97

  Bernard, Douglas A ^a  

^a Philips Signetics Company   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGING TECHNIQUES -- FOCUSING; PHOTORESISTS;

AIR-RESIST INTERFACE; BULK IMAGING EFFECTS; EFFECTIVE DEFOCUS; FOCUS EFFECTS; LATENT IMAGE FORMATION;

LITHOGRAPHY;

EID: 0024055901     PISSN: 08946507     EISSN: 15582345     Source Type: Journal    
DOI: 10.1109/66.4379     Document Type: Article

References (30)

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