메뉴 건너뛰기




Volumn 44, Issue 6, 1997, Pages 930-936

Base-collector leakage currents in InP/InGaAs double heterojunction bipolar transistors

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DRY ETCHING; LEAKAGE CURRENTS; METALLIZING; PLATINUM; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031168578     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.585538     Document Type: Article
Times cited : (21)

References (15)
  • 1
    • 0029373658 scopus 로고    scopus 로고
    • "InP/InGaAs double heterostructure bipolar transistors for high-speed IC's and OEIC's," vol. 38, no. 9, pp. 1703-1709, 1995.
    • Y. Matsuoka and E. Sano, "InP/InGaAs double heterostructure bipolar transistors for high-speed IC's and OEIC's," Solid-State Electron., vol. 38, no. 9, pp. 1703-1709, 1995.
    • Solid-State Electron.
    • Matsuoka, Y.1    Sano, E.2
  • 3
    • 0030085103 scopus 로고    scopus 로고
    • "Metallurgical stability of Ohmic contacts on thin base InP/InGaAs/InP HBT's," vol. 17, no. 2, 1996.
    • E. F. Chor, R. J. Malik, R. A. Hamm, and R. Ryan, "Metallurgical stability of Ohmic contacts on thin base InP/InGaAs/InP HBT's," IEEE Electron Device Lett., vol. 17, no. 2, 1996.
    • IEEE Electron Device Lett.
    • Chor, E.F.1    Malik, R.J.2    Hamm, R.A.3    Ryan, R.4
  • 4
    • 0027187369 scopus 로고    scopus 로고
    • "Breakdown-speed considerations in InP/InGaAs single- and double-heterostructure bipolar transistors," vol. 40, pp. 2-8, Jan. 1993.
    • H. F. Chau, D. Pavlidis, J. Hu, and K. Tomizawa, "Breakdown-speed considerations in InP/InGaAs single- and double-heterostructure bipolar transistors," IEEE Trans. Electron Devices, vol. 40, pp. 2-8, Jan. 1993.
    • IEEE Trans. Electron Devices
    • Chau, H.F.1    Pavlidis, D.2    Hu, J.3    Tomizawa, K.4
  • 5
    • 0027226503 scopus 로고    scopus 로고
    • "InGaAs/InP double heterostructure bipolar transistors for high-speed and high-voltage driver circuit applications," 93 Proc., 1993, pp. 565-568.
    • R. Bauknecht, H. Duran, M. Schmatz, and H. Melchior, "InGaAs/InP double heterostructure bipolar transistors for high-speed and high-voltage driver circuit applications," in IPRM'93 Proc., 1993, pp. 565-568.
    • In IPRM'
    • Bauknecht, R.1    Duran, H.2    Schmatz, M.3    Melchior, H.4
  • 7
    • 0026953114 scopus 로고    scopus 로고
    • "Stress current behavior of InAlAs/InGaAs and AlGaAs/GaAs HBT's with polyimide passivation," vol. 13, pp. 560-562, Nov. 1992.
    • S. Tanaka, K. Kasahara, H. Shimawaki, and K. Honjo, "Stress current behavior of InAlAs/InGaAs and AlGaAs/GaAs HBT's with polyimide passivation," IEEE Electron Device Lett., vol. 13, pp. 560-562, Nov. 1992.
    • IEEE Electron Device Lett.
    • Tanaka, S.1    Kasahara, K.2    Shimawaki, H.3    Honjo, K.4
  • 8
    • 0029515723 scopus 로고    scopus 로고
    • "Reliability of InP-Based HBT 1C technology for high-speed, low-power applications," vol. 43, pp. 3048-3054, Dec. 1995.
    • M. Hafizi, W. E. Stanchina, F. Williams Jr., and J. F. Jensen, "Reliability of InP-Based HBT 1C technology for high-speed, low-power applications," IEEE Trans. Microwave Theory Tech., vol. 43, pp. 3048-3054, Dec. 1995.
    • IEEE Trans. Microwave Theory Tech.
    • Hafizi, M.1    Stanchina, W.E.2    Williams Jr., F.3    Jensen, J.F.4
  • 9
    • 33747294366 scopus 로고    scopus 로고
    • "Double-heterojunction GaAlInAs/GaInAs bipolar transistor grown by molecular beam epitaxy," 7, pp. 516-518, Sept. 1986.
    • J. L. Pelouard, P. Hesto, J. P. Praseuth, and L. Goldstein, "Double-heterojunction GaAlInAs/GaInAs bipolar transistor grown by molecular beam epitaxy," IEEE Electron Device Lett., vol. EDL-7, pp. 516-518, Sept. 1986.
    • IEEE Electron Device Lett., Vol. EDL
    • Pelouard, J.L.1    Hesto, P.2    Praseuth, J.P.3    Goldstein, L.4
  • 11
    • 0001069416 scopus 로고    scopus 로고
    • "InGaAs/InP double-heterojunction bipolar transistors with step graded InGaAsP between InGaAs base and InP collector grown by metalorganic chemical vapor deposition," vol. 59, no. 21, pp. 2697-2699, 1991.
    • M. Ohkubo, A. Iketani, T. Ijichi, and T. Kikuta, "InGaAs/InP double-heterojunction bipolar transistors with step graded InGaAsP between InGaAs base and InP collector grown by metalorganic chemical vapor deposition," Appl. Phys. Lett., vol. 59, no. 21, pp. 2697-2699, 1991.
    • Appl. Phys. Lett.
    • Ohkubo, M.1    Iketani, A.2    Ijichi, T.3    Kikuta, T.4
  • 12
    • 0014737777 scopus 로고    scopus 로고
    • "The prediction of tunnel diode voltage-current characteristics," vol. 13, pp. 131-138, 1970.
    • T. A. Demassa and D. P. Knott, "The prediction of tunnel diode voltage-current characteristics," Solid-State Electron., vol. 13, pp. 131-138, 1970.
    • Solid-State Electron.
    • Demassa, T.A.1    Knott, D.P.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.