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Volumn 20, Issue 3, 1996, Pages 349-356
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Nanolithography with an atomic force microscope
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
DEPOSITION;
ELECTRON BEAMS;
ELECTRON MICROSCOPY;
FABRICATION;
HETEROJUNCTIONS;
LITHOGRAPHY;
MAGNETORESISTANCE;
MASKS;
PHOTORESISTS;
SEMICONDUCTING ALUMINUM COMPOUNDS;
SEMICONDUCTING GALLIUM ARSENIDE;
AMORPHOUS CARBON TIPS;
ELECTRON BEAM DEPOSITION;
ETCH MASKS;
EVAPORATION SHADOW MASKS;
NANOTECHNOLOGY;
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EID: 0029726256
PISSN: 07496036
EISSN: None
Source Type: Journal
DOI: 10.1006/spmi.1996.0088 Document Type: Article |
Times cited : (25)
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References (12)
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