메뉴 건너뛰기




Volumn 20, Issue 3, 1996, Pages 349-356

Nanolithography with an atomic force microscope

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; ELECTRON BEAMS; ELECTRON MICROSCOPY; FABRICATION; HETEROJUNCTIONS; LITHOGRAPHY; MAGNETORESISTANCE; MASKS; PHOTORESISTS; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM ARSENIDE;

EID: 0029726256     PISSN: 07496036     EISSN: None     Source Type: Journal    
DOI: 10.1006/spmi.1996.0088     Document Type: Article
Times cited : (25)

References (12)
  • 2
    • 36449004495 scopus 로고
    • SPIE Press, Bellingham, WA
    • T. Teuschler, K. Mahr, S. Miyazaki, M. Hundhausen and L. Ley, Appl. Phys. Lett. 66, 2499 (1995); C. R. K. Marrian (Ed), The Technology of Proximal Probe Lithography, SPIE Press, Bellingham, WA, (1993).
    • (1993) The Technology of Proximal Probe Lithography
    • Marrian, C.R.K.1
  • 4
    • 30244452463 scopus 로고    scopus 로고
    • AFM tips from Nanoprobe
    • AFM tips from Nanoprobe.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.