Etching new IC materials for memory devices

Solid State Technology

Volumn 41, Issue 8, 1998, Pages 53-58

  DeOrnellas, Stephen P ^a   Cofer, Alferd ^a  

^a Tegal Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002427089     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (3)

1. T.C. Taylor, H.A. Harper, "Chemically Assisted Etching of PZT-based Ferroelectric, Dielectric, and Noble Metal Capacitor Electrodes," Tegal 20th Annual Plasma Seminar Proceedings, San Francisco, CA, July 1994.
2. The National Technology Roadmap for Semiconductors, L. Wilson et al., eds., Semiconductor Industry Association, 1997.
3. 3/Ru Stacked Capacitors Using X-ray Lithography," IEDM, pp. 95-903, December 1995.