Plasma etch processing of advanced ferroelectric devices

Integrated Ferroelectrics

Volumn 16, Issue 1-4, 1997, Pages 53-61

  Cofer, Alferd ^a   Rajora, Paritosh ^a   DeOrnellas, Steve ^a   Keil, Doug ^a  

^a Tegal   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; LIGHT EMISSION; PLASMA ETCHING; RANDOM ACCESS STORAGE; SCANNING ELECTRON MICROSCOPY; STATISTICAL METHODS;

DYNAMIC RANDOM ACCESS MEMORY (DRAM);

FERROELECTRIC DEVICES;

EID: 0031360253     PISSN: 10584587     EISSN: None     Source Type: Journal    
DOI: 10.1080/10584589708013029     Document Type: Article

References (4)

1. T. C. Taylor, H.A. Harper presented at Tegal 20th Annual Plasma Seminar Proceedings, San Francisco, Ca. (July, 1994) Chemically Assisted Etching of PZT-Based Ferroelectric Dielectric and Noble Metal Capacitor Electrodes.
2. th International Symposium on Integrated Ferroelectrics, Monterey, Ca. (March, 1994) Electrical Characteristics Of Ferroelectric PZT Thin Films For Gieabit-Scale Drams.
3. th International Symposium on Integrated Ferroelectrics, Monterey, Ca. (March, 1994) The Degradation of Ferroelectric Properties of PZT Thin Films Due To Plasma Damage.
4. th International Symposium on Integrated Ferroelectrics, Monterey, Ca. (March, 1994) 256Kb Ferroelectric Nonvolatile Memory Technology for 1T/1C Cell With 100ns Read/Write Time At 3V.