Co silicide formation on epitaxial Si1-yCy/Si (001) layers

Journal of Applied Physics

Volumn 87, Issue 7, 2000, Pages 3306-3312

  Roichman, Y ^a   Berner, A ^a   Brener, R ^a   Cytermann, C ^a   Shilo, D ^a   Zolotoyabko, E ^a   Eizenberg, M ^a   Osten, H J ^b  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^b IHP   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001708033     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.372341     Document Type: Article

References (19)

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