Roles of SiH3 and SiH2 radicals in particle growth in rf silane plasmas

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 7 SUPPL. B, 1997, Pages 4985-4988

  Kawasaki, Hiroharu ^a   Ohkura, Hiroshi ^a   Fukuzawa, Tsuyoshi ^a   Shiratani, Masaharu ^a   Watanabe, Yukio ^a   Yamamoto, Yasuo ^b   Suganuma, Shinji ^b   Hori, Masaru ^b   Goto, Toshio ^b  

^a KYUSHU UNIVERSITY   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

Absorption; Coagulation; Dust; Particle; Particulate; Plasma CVD; Processing plasma; RF discharge; RF plasma; SEM

Indexed keywords

ABSORPTION; CHEMICAL VAPOR DEPOSITION; COAGULATION; FILM GROWTH; INFRARED SPECTROSCOPY; LIGHT SCATTERING; NUCLEATION; PARTICLES (PARTICULATE MATTER); PLASMA DENSITY; SCANNING ELECTRON MICROSCOPY; SILANES;

PARTICLE GROWTH;

CRYSTAL GROWTH;

EID: 0031176680     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.4985     Document Type: Article

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