On the unusual electromigration behavior of copper interconnects

Journal of Applied Physics

Volumn 80, Issue 7, 1996, Pages 3782-3791

  Glickman, E ^a   Nathan, M ^a  

^a TEL AVIV UNIVERSITY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001438054     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363330     Document Type: Article

References (51)

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