Electromigration-induced drift in damascene vs. conventional interconnects: An intrinsic difference

Materials Research Society Symposium - Proceedings

Volumn 516, Issue , 1998, Pages 89-94

  Proost, J ^a   Samajdar, I ^a   Witvrouw, A ^a   Maex, K ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMIGRATION; METALLIZING; SEMICONDUCTING ALUMINUM COMPOUNDS;

DAMASCENE;

SEMICONDUCTOR DEVICE TESTING;

EID: 0032309669     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-516-89     Document Type: Conference Paper

References (17)