Effect of low-molecular-weight dissolution-promoting compounds in DNQ-novolac positive resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2724, Issue , 1996, Pages 420-437

  Kawabe, Yasumasa ^a   Tan, Shiro ^a   Nishiyama, Fumiyuki ^a   Sakaguchi, Shinji ^a   Kokubo, Tadayoshi ^a   Blakeney, Andrew J ^a   Ferreira, Lawrence ^a  

^a FUJIFILM CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOLUTION; FILMS; MOLECULAR WEIGHT; OPTIMIZATION; ORGANIC COMPOUNDS; PHOTOLITHOGRAPHY;

DIAZONAPHTHOQUINONE; NOVOLAK RESIN;

PHOTORESISTS;

EID: 0029770232     PISSN: None     EISSN: None     Source Type: None    
DOI: 10.1117/12.241841     Document Type: Conference Paper

References (16)